K. Denpoh, Multiphysics Simulations of Rarefied Gas Flow using DSMC created on COMSOL Multiphysics®, COMSOL Conference 2024 Tokyo, Tokyo, 2024.
J. S. Kim. K. Denpoh, M. Anderson, and M. Matsukuma, PiCHY: A GPU Parallelized PIC-MCC Simulator for Actual 300 mm Reactor, Proc. 45th Int. Symp. Dry Process, Chitose, 2024, P-34, pp. 99-100.
K. Denpoh, J. S. Kim. M. Anderson, and M. Matsukuma, Effects of ionization by Ar+ on Ar CCP simulated using GPU-PIC with DNT+DM, Proc. 45th Int. Symp. Dry Process, Chitose, 2024, P-32, pp. 95-96.
J. S. Kim, K. Denpoh, M. Anderson, and M. Matsukuma, PiCHY: A GPU Parallelized PIC-MCC Simulator for Actual 300 mm Reactor, 77th Annual Gaseous Electronics Conf., San Diego, CA, 2024, DF1.00003. [Abstract]
[Invited] J. S. Kim, K. Denpoh, S. Kawaguchi, K. Satoh, and M. Matsukuma, A Study for Solving the Boltzmann Equation with Variable E/N using Physics-informed Neural Networks, 77th Annual Gaseous Electronics Conf., San Diego, CA, 2024, EM2.00013. [Abstract]
[Invited] J. S. Kim, K. Denpoh, S. Kawaguchi, K. Satoh, and M. Matsukuma, Numerical starategy for solving the Boltzmann equation with variable E/N using physics-informed neural networks, The 5th Int. Conf. Data-Driven Plasma Sci., UC Berkeley, CA, 2024, I-5
伝宝, DC電界下におけるHBr中の電子スウォームのヒステリシス, 第71回応用物理学会春季学術講演会, 東京, 2024, 24p-31B-1.[Abstract]
K. Denpoh and M. Matsukuma, Extension of ion-neutral reactive collision model DNT+ to polar molecules based on average dipole orientation theory, Proc. 41st Symp. Plasma Processing (SPP-41), Tokyo, 2024, 23a-1, pp. 28-29.
K. Denpoh, Virtual solid cell for mimicking porous media in Direct Simulation Monte Carlo method, Annual Meeting of the Japan Society of Vacuum and Surface Science 2023, Nagoya, 2023, 1Ia06. [Abstract] [Presentation]
伝宝, 3 MHzで駆動する容量結合Arプラズマの2次元PIC-MCCシミュレーション, 第84回応用物理学会秋季学術講演会, 熊本, 2023, 21a-A302-5.
[Invited] K. Denpoh, Comprehensive Ion-Molecule Reactive Collision Model for Particle-based Plasma Simulation Models, Abstract Book of The 14th EU-Japan Joint Symposium on Plasma Processing (JSPP-14), Okinawa, 2023, I-37, pp. 61-62.
J. S. Kim, K. Denpoh, S. Kawaguchi, K. Satoh, and M. Matsukuma, Numerical Strategy for Solving the Boltzmann Equation with variable E/N using Physics informed Neural Networks, 第39回プラズマ新領域研究会「プラズマ諸特性理解の新展開」, 苫小牧, 2023.
H. Li, K. Ishii, S. Sasaki, M. Kamiyama, A. Oda, and K. Denpoh, Computational and Experimental Analysis of TEOS-based Plasma to Understand SiO2 PECVD Mechanisms, Proc. 43th Int. Symp. Dry Process, Osaka, 2022, C-4, pp. 33-34.
K. Denpoh,The First DSMC Model created on COMSOL Multiphysics®, Book of Abst. 32nd Int. Symp. Rarefied Gas Dynamics, Seoul, South Korea (Hybrid), 2022, p. 68.
李・石井・佐々木・神山・小田・伝宝, テトラエトキシシラン(TEOS)プラズマのシミュレーション解析, 第69回応用物理学会春季学術講演会, ハイブリッド, 2022, 25p-E104-6.
石井・佐々木・神山・李・伝宝・小田, 低圧TEOSガスRFプラズマから基板への入射ラジカル種および正イオン種の質量分析, 第69回応用物理学会春季学術講演会, ハイブリッド, 2022, 25p-E104-5.
K. Denpoh, Multiphysics simulations of rarefied gas flows using DSMC with quasi-Nanbu scheme, Annual Meeting of the Japan Society of Vacuum and Surface Science 2021, Online, 2021, 1Ea05. [Abstract]
[依頼講演] 伝宝, PEALDでの不均一な成膜分布から学ぶTiの成膜機構と選択成膜へのヒント, 化学工学会CVD反応分科会 第34回シンポジウム「選択成長にむけたALD/ALE技術」, オンライン, 2021. [開催案内]
[依頼講演] 伝宝, 半導体デバイス製造におけるプラズマを用いたTi薄膜の成膜機構, 高機能トライボ表面プロセス部会 第16回例会「プラズマハードコーティングに関わる計測およびシミュレーション」, オンライン, 2021. [開催案内]
K. Denpoh, Effects of Driving Frequency on Plasma Density in Capacitively Coupled Plasmas at Torr-order Pressure, Proc. 38th Symp. Plasma Processing / 33rd Symp. Plasma Science for Materials, Online, 2021, LO29-AM-B-01.
H. Li and K. Denpoh, Computational Analyses of TEOS-Based Plasma Characteristics to Clarify SiO2 Deposition Mechanisms in PECVD Processes, The 8th ICMAP & The 9th ISFM, Online, 2021, WB1-3.
K. Denpoh, DSMC created on COMSOL® (II): Quasi-Nanbu scheme extended to diatomic molecules and gas mixtures, COMSOL Conference 2020 Tokyo, Online, 2020, PF-006.
K. Denpoh, Quasi-Nanbu scheme extended to gas mixture and its application, Annual Meeting of the Japan Society of Vacuum and Surface Science 2020, Online, 2020, 2Ep04. [Abstract]
伝宝・森田・松土, 容量結合プラズマのTorrオーダー圧力におけるプラズマ密度の印加周波数依存性, 第67回応用物理学会春季学術講演会, 東京, 2020, 12p-A302-11. [Abstract]
李・伝宝, TEOSを用いたSiO2 PECVD反応機構における酸素イオンとラジカルの役割, 第67回応用物理学会春季学術講演会, 東京, 2020, 12p-A205-1. [Abstract]
山本・鈴木・伝宝・松隈, 微細パターンに対する成膜・エッチングプロセスの形状・膜質予測モデル, COMSOL Conference 2019 Tokyo, 東京, 2019, N2-2. [Abstract]
[依頼講演] 伝宝, 半導体製造真空反応器内の希薄気体流解析技術, 2019年日本表面真空学会学術講演会, 筑波, 2019, 3Fp04. [Abstract]
K. Denpoh, P. Moroz, T. Kato, and M. Matsukuma, Feature profile simulation of plasma-enhanced Ti atomic layer deposition, Proc. XXXIV ICPIG & ICRP-10, Sapporo, 2019, PO16PM-013.
Best Oral Presentation Award
K. Denpoh, A DSMC model created on COMSOL Multiphysics, COMSOL Conference 2018 Tokyo, Tokyo, 2018, S-2.
[Abstract]
K. Denpoh, Quasi-Nanbu scheme and a DSMC model created on COMSOL Multiphysics, Book of Abstracts, Annual Meeting of Jpn. Vac. Surf. Soc., Kobe, 2018, 2P05, p. 125.
K. Denpoh, P. Moroz, T. Kato, and M. Matsukuma, Multiscale Simulation of Titanium PECVD Process, Proc. 40th Int. Symp. Dry Process, Nagoya, 2018, P-34, pp. 119-120.
H. Li, H. Higuchi, S. Kawaguchi, K. Sato, and K. Denpoh, Computational study on silicon oxide PECVD process using TEOS/O2/Ar/He, Proc. 40th Int. Symp. Dry Process, Nagoya, 2018, P-30, pp. 111-112.
李・川口・樋口・伝宝・佐藤, TEOSを用いたSiO2 PECVD反応モデルの構築と解析, 第79回応用物理学会秋季学術講演会, 名古屋, 2018, 20a-438-12. [Abstract]
T. Shirafuji and K. Denpoh, Helmholtz equation for representing a potential profile in a weakly collisional quasi-neutral presheath, Proc. 39th Int. Symp. Dry Process, Tokyo, 2017, pp. 99-100.
S. Iwashita, K. Denpoh, M. Kagaya, T. Kikuchi, N. Noro, T. Hasegawa, T. Moriya, and A. Uedono, Characteristics of titanium dioxide films fabricated via PEALD process with ion energy control, TACT2017 International Thin Films Conference, Hualien, Taiwan, 2017, C-O-213.
[招待講演] 伝宝・白藤, 多次元マルチフィジックスRFシー スモデル, 平成29年電気学会基礎・材料・共通部門大会(A部門大会), 室蘭, 2017, 20-F-a2-5.
白藤・伝宝, 静的準中性プレシースの計算に関する検討, 平成29年電気学会基礎・材料・共通部門大会(A部門大会), 室蘭, 2017, 20-F-a2-4.
K. Denpoh, Another possible origin of temperature and pressure gradients across vanes in the Crookes radiometer, Book of Abstracts, 58th Annual Symposium of the Vacuum Society of Japan, Yokohama, 2017, p. 92. [Abstract] [Presentation]
鈴木・川口・松隈・伝宝・松崎, FEM解析ソフトウェアを活用したPIC-MCCプラズマシミュレーション, 計算工学講演会論文集, さいたま, 2017, F-05-4.
白藤・伝宝, 静的シース構造の計算に関する検討, 電気学会プラズマ/パルスパワー/放電合同研究会資料, 京都, 2017, PST-17-044/PPT-17-044/ED-17-064.
A. Suzuki, S. Kawaguchi, M. Matsukuma, K. Denpoh, and K. Matsuzaki, PIC-MCC Plasma Simulation utilizing COMSOL Multiphysics, COMSOL Conference 2016 Tokyo, Tokyo, 2016.
K. Denpoh, S. Wakabayashi, S. Okabe, Y. Kobayashi, S. Kawasaki, K. Hikawa, Y. Yamazawa, T. Kato, M. Matsukuma, C. Koshimizu, T. Shimizu, and S. Murakami, Novel PECVD equipment for Ti thin film deposition utilizing Ar-based plasma and wafer stage impedance control, Proc. 38th Int. Symp. Dry Process, Sapporo, 2016, pp. 183-184.
A. Suzuki, S. Kawaguchi, M. Matsukuma, and K. Denpoh, A PIC-MCC plasma model created on COMSOL Multiphysics, 77th JSAP Autumn Meeting, Niigata. 2016, 13p-A41-4.
T. Shirafuji and K. Denpoh, A Semi-Analytical Model for Static Sheath Including Presheath, Joint Symposium of the 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9) and the 28th Symposium on Plasma Science for Materials (SPSM-28), Nagasaki, 2015.
A. Suzuki, S. Kawaguchi, K. Denpoh, K. Satoh, K. Matsuzaki, Numerical Analyses of Plasma Swarm Parameters using Monte Carlo Method, COMSOL Conference 2015 Tokyo, Tokyo, 2015.
K. Denpoh, Simulation of Ion Energy and Angular Distribution Functions using a Multidimensional RF Sheath Model, Proc. 68th Annual Gaseous Electronics Conference, 9th International Conference on Reactive Plasmas, and 33rd Symposium on Plasma Processing (GEC-68/ICRP-9/SPP-33), Honolulu, HI, 2015, GT1-78.
伝宝, CFD-ACE+を用いたプラズマプロセス装置のマルチフィジックスシミュレーション, CFD-ACE+マルチフィジックスシミュレーションセミナー, 東京, 2015.
K. Denpoh, Simulation of Ion Energy and Angular Distribution Functions using Multidimensional Radio Frequency Sheath Model, COMSOL Conference 2014 Tokyo, Tokyo, 2014.
[招待講演] 伝宝, 半導体製造装置のプラズマシミュレーション技術, 第75回応用物理学会秋季学術講演会シンポジウム「コンピュータによるプラズマシミュレーションの実際(いま、何をどこまで計算できるのか)」, 札幌, 2014, 18p-S1-7. [Proceeding]
P. L. G. Ventzek, L. Chen, K. Denpoh, K. Ishibashi, G. S. Hwang, T. Iwao, S. Y. Kang, Y. Kobayashi, M. Matsukuma, P. Moroz, T. Nozawa, L. Raja, A. Ranjan, I. Sawada, A. Suzuki, H. Ueda, and J. Yoshikawa, Simulations of plasma processes and equipment for semiconductor device fabrication: status and outlook, 8th Int. Conf. Reactive Plasmas and 31st Symp. Plasma Processing, Fukuoka, 2014.
K. Denpoh, Simulations of Semiconductor Manufacturing Equipment using CFD-ACE+ with Realistic Plasma Reaction Models, CFD-ACE User Meeing, Tokyo, 2013.
[招待講演] 伝宝, 半導体プラズマプロセス装置のシミュレーション技術, 化学工学会第44回秋季大会講演要旨集, 仙台, 2012, G206.
K. Denpoh, Self-Consistent PIC-MCC Simulations of Striations in Radio Frequency Inductively Coupled Plasmas, Book of Abstracts of The 8th EU-Japan Joint Symposium on Plasma Processing (JSPP2012), Nara, 2012, p. P-08.
伝宝, Ar/O2誘導結合プラズマのシミュレーションとRRK理論に基づいたイオン-分子反応モデルの紹介, 2011年度原子分子データフォーラムセミナー「O2を含む原子分子過程を考慮したプラズマ研究」, 土岐, 2011.
伝宝, 単周波および二周波CCPにおけるシースのシミュレーション, 第8回プラズマ新領域研究会「プラズマプロセスと先端数値解析」, 横浜, 2011.
K. Denpoh, Multidimensional RF Sheath Model for Single- and Dual-Frequency Capacitively Coupled Plasmas, COMSOL Conference 2010 Tokyo, Tokyo, 2010.
K. Denpoh and T. Shirafuji, Semianalytical FEM Model for RF Sheaths in Single- and Dual-Frequency Capacitively Coupled Plasmas, Abstracts of The 10th Asia Pacific Conference on Plasma Science and Technology (APCPST)
and The 23rd Symposium on Plasma Science for Materials (SPSM), Jul, 2010, Jeju, Korea, p. 151.
K. Denpoh, Semianalytical FEM Model for RF Sheaths in Single- and Dual-Frequency Capacitively Coupled Plasmas, COMSOL Conference 2009 Tokyo, Tokyo, 2009.
K. Denpoh, Effects of Electrode Temperature on Electron Density in Capacitively Coupled Plasmas, CD of Proc. PAM Users' Conference in Asia, Tokyo, 2009.
K. Denpoh, Locally Enhanced Discharges at Gas Hole Outlets of Showerhead in a Plasma Etch Reactor, Book of Abstracts of The 6th EU-Japan Joint Symposium on Plasma Processing, Okinawa, 2008, pp. 61-62.
K. Denpoh, Locally Enhanced Discharges at Gas Hole Outlets of Showerhead in a Plasma Etch Reactor, Proc. PAM Users' Conf. in Asia, Tokyo, 2007, pp. 425-433.
L. Chen, K. Denpoh, P. Ventzek, and A. Ranjan, Secondary Electron Effects in a DC/RF Hybrid Capacitive Coupled Plasma Etcher, 60th Annual Gaseous Electronics Conference, Arlington, VA, 2007. [Abstract]
K. Denpoh, G. Wakayama, and K. Nanbu, Sheath Model for Dual-Frequency Capacitively Coupled Plasmas, Proc. 21st Symp. Plasma Processing, Sapporo, 2004, pp. 328-329. [Abstract]
K. Denpoh and K. Nanbu, Two-dimensional Simulation of RF CF4 Discharge Using the Particle-in-Cell/Monte Carlo Method, Proc. 4th Int. Conf. Reactive Plasmas and 16th Symp. Plasma Processing, Maui, 1998, pp.1-2. [Proceeding] [Presentation]
K. Denpoh and K. Nanbu, Self-consistent Particle Simulation of Radio Frequency CF4 Discharge: Effects of Secondary Electron Emission Coefficient and Gap Distance between Electrodes, Proc. 15th Symp. Plasma Processing, Hamamatsu, 1998, pp. 506-509. [Proceeding]
K. Denpoh and K. Nanbu, Self-consistent Particle Simulation of Radio-Frequency CF4 Discharge Including All Reactive Collisions of Ions, Proc. 4th Int. Symp. Sputtering & Plasma Processes, Kanazawa, 1997, pp. 459-464.
伝宝, エッチングチャンバー内における混合ガス流の解析, 第73期日本機会学会通常総会講演会講演論文集(III), 1996, pp. 149-150. [Abstract]
H. Sasaki, K. Nanbu, V. V. Serikov, and K. Denpoh, Effect of T-R Energy Transfer on the Angular Distribution of Molecular Flux Effusing into a Vacuum, Proc. 19th Int. Symp. Rarefied Gas Dyn., Vol. 2, 1995, pp. 1439-1455. [Abstract]
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