K. Denpoh, G. Wakayama, and K. Nanbu, Proc. 21st Symp. Plasma Processing, Sapporo, 2004, pp. 328-329.

Sheath Model for Dual-Frequency Capacitively Coupled Plasmas


Kazuki Denpoh, Go Wakayama*, and Kenichi Nanbu**

ESD Developemnt Dept., Tokyo Electron AT Ltd., 2381-1 Kitagejo, Fujii-cho, Nirasaki 407-8511
*Fuji Research Institute Corp., 2-3 Kanda-nishiki-cho, Chiyoda-ku, Tokyo 101-8443
**Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577


Lieberman's radio frequency (RF) sheath theory is extended to dual-frequency capacitively coupled plasmas. Then, the plasma potential and the sheath thickness described in the extended RF sheath theory are incorporated into the Particle-in-Cell, Monte-Carlo-Collision (PIC-MCC) sheath model. The results obtained using PIC-MCC sheath model are coincident well with the results from one dimensional PIC-MCC self-consistent plasma model.


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